The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.[3 j S. Cherekdjian, W. Weisenberger, Proc. of 8th Intl. Conf. on Ion Implantation Technology, Univ. of Surrey, Guildford, UK, July 30, 1990. ... [ll ] CX-Scan Controller Manual, Fab-m Corp., 650 Vaqueros Ave., Unit B, Sunnyvale, CA 94086.
|Title||:||Ion Implantation Technology - 94|
|Author||:||S. Coffa, G. Ferla, E. Rimini, F. Priolo|
|Publisher||:||Newnes - 1995-05-16|